-
nanomechanical BariumTitanate Aluminum HardDiskMedia MultiLayerCeramicCapacitor TCS Protein NUS_NNI_Nanocore Ucl TransitionMetal atomic_layer OpticalWaveguide FrictionalForceMicroscopy Semiconductor ThinFilm Platinum polymeric_arrays FailureAnlaysis Annealed Tape doped FailureAnalysis MagneticArray GaP Optoelectonics Force-distance LMF AnodizedAluminumOxide 2-vinylpyridine NUSNNI Dimethicone light_emission University_of_Regensburg Device Crystal
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Christmas Ball Lithography on Si
Create oxidation layers on bare Si surface using bias mode of lithography.
Scanning Conditions
- System: NX10
- Scan Mode: Lithography
- Cantilever: AD-40-SS (k=40N/m, f=200kHz)
- Scan Size: 40μm×40μm
- Scan Rate: 0.5Hz
- Pixel Size: 1024 × 1024
- Tip Bias: -10V for patterened area
- Scan Mode: Lithography
- Cantilever: AD-40-SS (k=40N/m, f=200kHz)
- Scan Size: 40μm×40μm
- Scan Rate: 0.5Hz
- Pixel Size: 1024 × 1024
- Tip Bias: -10V for patterened area