-
temp_control exfoliate Scanning_Thermal_Microscopy LateralPFM LaAlO3 Gong India WS2 CntFilm ContactModeDots PolyimideFilm Optical PolyStylene TipBiasMode Vacuum temp Roughness HighAspect Hydroxyapatite WWafer AlkaneFilm CompactDisk ScanningIon-ConductanceMicroscopy Friction AM_SKPM PS_PVAC aluminum_nitride F14H20 Singapore Glass SFAs GlassTemperature ChemicalCompound HiVacuum Silicon
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Atomic steps on GaP(Gallium Phosphide) layer on Si
Scanning Conditions
- System: NX20
- Scan Mode: Non-contact
- Cantilever: PPP-NCHR (k=42N/m, f=300kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 1Hz
- Pixel: 512×512