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non_contact Lateral_Force_Microscopy 2d_materials CNT CuParticle Deposition HDD Pvdf Hair NtuEee Conductance Blood Microchannel HardDisk temperature controller AFM Bismuth Filter layers PS_LDPE PhaseChange Hexylthiophene Zagreb Adhesive CuSubstrate I-VSpectroscopy OpticalWaveguides frequency_modulation SSRM Ca10(PO4)6(OH)2 gallium_nitride dielectric trench Polyethylene CastIron SAM Styrene
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Cutting Graphene
Scanning Conditions
- System : FX40
- Scan Mode: Contact after lithography
- Scan Rate : 0.7 Hz
- Scan Size : 30μm×30μm
- Pixel Size : 256×256
- Cantilever : ElectricMulti75-G (k=3N/m, f=75kHz)
- Lithography condition : Force 500 nN, writing speed 0.1μm/s, AC bias 10 V @ 40kHz