-
pulsed_laser_deposition Polyaniline ForceVolumeMapping semifluorinated_alkane Fluoride UnivMaryland Platinum SPMLabs Sapphire thermal_conductivity Defect BTO BismuthVanadate ShenYang Bmp TemperatureControl Ram Switching SiliconCrystal Inorganic_Compound Polyvinylidene_fluoride Cobalt-dopedIronOxide PS_PVAC Protein TriGlycineSulphate SFAs Mapping bias_mode UnivCollegeLondon Magnetostrictive Solar SelfAssembly Growth DomainSwitching MagneticForce
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Photoresist pattern (post-development process)
Scanning Conditions
- System : NX-3DM
- Scan Mode: Non-contact
- Scan Rate : 0.1 Hz
- Scan Size : 2μm×10μm
- Pixel Size : 512×2048
- Cantilever : EBD-R2-NCLR (k=45N/m, f=190kHz)