-
silicon_oxide plastic HfO2 IMT_Bucharest AtomicLayer TCS SRAM Bacterium WPlug FrictionForce temperature_control LiNbO3 LateralPFM LightEmiting DeoxyribonucleicAcid atomic_steps Cross-section Metal Nanostructure FFM Co/Cr/Pt SiliconeOxide Forevision BiFeO3 Dimethicone Phase SolarCell CalciumHydroxide Aluminium_Oxide Glass Sidewall PatternedSapphireSubstrat frequency_modulation Non-ContactMode GlassTemp
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
2L-MoS₂ (2/3)
Scanning Conditions
- System : FX40
- Sample bias: 0.5 V
- Scan Mode: C-AFM, LFM
- Scan Rate : 12 Hz
- Scan Size : 1μm×1μm
- Pixel Size : 512×512
- Cantilever : ElectricMulti75-G (k=3N/m, f=75kHz)