-
KelvinProbeForceMicroscopy Magnetic BismuthVanadate BreastCancerCell Hexatriacontane Conductance PS_PVAC Typhimurium Hydroxyapatite Tungsten_disulfide Hexacontane sputter hard_disk VerticalPFM Magnetostrictive PDMS TiO2 Lateral_Force_Microscopy fifber Nickel Composition InorganicCompound Mfm Ca10(PO4)6(OH)2 PolyvinylAcetate 2d_materials FAFailureAnlaysis IcelandSpar ThermalDetectors CBD BFO Chromium Vanadate solar_cell Yeditepe
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Hard defect repair of photomask
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 1.25μm×1.25μm
- Pixel Size : 256×256
- Cantilever : OMCL-AC160TS for imaging, AD-40 AS for repairing (k=42N/m, f=330kHz)