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DOE Chloroform SoftSample PhaseChange PolyimideFilm margarine Aluminium_Oxide Butterfly Sio2 Galfenol Oxidation Lift Defect Workfunction SSRM ferromagnetic Hexylthiophene ScanningSpreadingResistanceMicroscopy Ecoli CrossSection GranadaUniv ForceVolumeMapping Polyaniline Inorganic_Compound Polyvinylidene_fluoride small_scan frequency_modulation MoS2 polymeric_arrays Pvdf SicMosfet BTO NCM\ 2d_materials STO
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Hard defect repair of photomask
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 1.25μm×1.25μm
- Pixel Size : 256×256
- Cantilever : OMCL-AC160TS for imaging, AD-40 AS for repairing (k=42N/m, f=330kHz)