-
Wafer nanomechanical LateralForce Ferrite BariumTitanate dichalcogenide TemperatureControlledAFM Thermal lift_mode OpticalElement Morphology Phenanthrene Alkane HexagonalBN Austenite INSP P3HT MolybdenumDisulfide PUR EFM NUS_NNI_Nanocore Regensburg ThermalConductivity AmplitudeModulation Electical&Electronics ito_film PvdfBead UnivMaryland SiWafer TiO2 Strontium Materials DNA WWafer Implant
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Al2O3-doped CaMnO3
1% Al2O3-doped CaMnO3 on LaAlO3 (001) orientation substrate by pulsed laser deposition.
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 1Hz
- Pixel Size: 256 × 256
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 1Hz
- Pixel Size: 256 × 256