-
Indium_tin_oxide OpticalModulator Polystyrene Wang Fendb Temasek_Lab SrO BloodCell EvatecAG Austenite temperature_control contact SPMLabs alkanes Sadowski Scanning_Thermal_Microscopy Polytetrafluoroethylene fe_nd_b FAFailureAnlaysis YttriaStabilizedZirconia Electrical&Electronics Pores MonoLayer SelfAssembly Ni81Fe19 LiBattery Iron Inorganic_Compound SrTiO3 Aluminum MagneticArray BreastCancerCell frequency_modulation Tungsten Blend
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
ExFoliated graphene on SiO₂/Si wafer
Scanning Conditions
- System : FX40
- Scan Mode: Non-Contact, Lithography
- Scan Rate : 1 Hz
- Scan Size : 10μm×10μm
- Pixel Size : 256×256
- Cantilever : PPP-EFM (k=2.8N/m, f=75kHz)
- Litho. Condition : Force 200nN, Writing speed 0.2 μm/s , AC bias 10 V @ 40 kHz, Humidity ~90% RH