-
BloodCell TappingMode Switching pinpoint mode Liquid rubber Calcite BismuthVanadate Pvdf heterojunctions align Photovoltaics MESA structure Ram CuParticle MoirePattern Hysteresys PatternedSapphireSubstrat LithiumNiobate Glass Austenite SSRM DLaTGS Composition Gallium Phenanthrene Pores Oxidation Sidewall doped non_contact MetalCompound mechanical property MechanicalProperties ito_film
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Hard defect repair of photomask
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 1.25μm×1.25μm
- Pixel Size : 256×256
- Cantilever : OMCL-AC160TS for imaging, AD-40 AS for repairing (k=42N/m, f=330kHz)