-
Hair Oxide CrystalGrowing MolybdenumDisulfide Workfunction AM_KPFM Growth CP-AFM Spincast Polydimethylsiloxane MetalCompound Ptfe LiquidCell STO DLaTGS Layer Polystyrene Piezo Korea Alkane Cell ferromagnetic Celebration China ThermalConductivity PinPointMode DeflectionOptics AAO Ferroelectric Optoelectronic cooling BiFeO3 BiasMode Adhesion PolymerBlend
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Trench Etch Profile on MESA
Top dielectric trench etch profile on MESA on Si wafer.
Scanning Conditions
- System: NX20
- Scan Mode: Non-contact
- Cantilever: AR5T-NCHR (k=42N/m, f=300kHz)
- Scan Size: 6μm×6μm
- Scan Rate: 0.12Hz
- Pixel Size: 1024 × 256
- Scan Mode: Non-contact
- Cantilever: AR5T-NCHR (k=42N/m, f=300kHz)
- Scan Size: 6μm×6μm
- Scan Rate: 0.12Hz
- Pixel Size: 1024 × 256