-
aluminum_nitride BismuthFerrite MoS2 StrontiuTitanate 2dMaterials MESA structure graphene_hybrid oxide_layer Temperature Conductance ShenYang Biology Crystal C36H74 PolyvinylideneFluoride ContactMode semifluorinated_alkane IndiumTinOxide Ram optoelectronics PVAP3HT FAFailureAnlaysis ConductingPolymer IVSpectroscopy ULCA Neodymium MagneticForce Magnets Silicon FailureAnalysis Patterns ForceVolumeMapping TransitionMetal PS_PVAC IRDetector
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Trench Etch Profile on MESA
Top dielectric trench etch profile on MESA on Si wafer.
Scanning Conditions
- System: NX20
- Scan Mode: Non-contact
- Cantilever: AR5T-NCHR (k=42N/m, f=300kHz)
- Scan Size: 6μm×6μm
- Scan Rate: 0.12Hz
- Pixel Size: 1024 × 256
- Scan Mode: Non-contact
- Cantilever: AR5T-NCHR (k=42N/m, f=300kHz)
- Scan Size: 6μm×6μm
- Scan Rate: 0.12Hz
- Pixel Size: 1024 × 256