-
ScanningIon-ConductanceMicroscopy SFAs Tin sulfide TemperatureControllerStage ForceDistanceSpectroscopy Iron Sadowski flakes temperature controller AFM self_assembly Hafnium_dioxide plastic ThermalConductivity Litho Nanotechnology Biofilm CNT Edwin LifeScience Mfm Cell ContactMode mono_layer Vinylpyridine contact MechanicalProperties Temasek_Lab HydroGel EFMAmplitude HACrystal FM-KPFM Ceramic Sio2 Boron LMF
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Lithography on Si substrate
Scanning Conditions
- System: NX10
- Scan Mode: Lithography
- Cantilever: ContscPt (k=0.2N/m, f=25kHz)
- Scan Size: 10μm×10μm
- Scan Rate: 1Hz
- Pixel: 1024×512
- Litho. mode: Tip bias mode
- Litho. Tip bias: Black -10V, White 0V